I am runnig some Monte Carlo simulations and there are some options for model libraries like Global+Local and Local. Also, after choosing model setup in ADE, in Monte Carlo simulation, you can choose Process only, Mismatch Only and Process and Mismatch. First, I want to learn what the diffrence is between model setup(Global+Local vs Local) and difference between Monte Carlo Options(Process&Mismatch vs Process vs Mismatch). I have searched a litlle bit and I have talked with colleagues but I couldn't find so much useful info.
If you help me or direct me to some useful references, I will appreciate.
Local variation aka mismatch is dependent on the device area, for a MOS w/l, and layout techniques.
Where global variation is related to your process corners often called process monte calro.
A good reference 'Understanding MOSFET Mismatch for Analog Design, C. McAndrew'.