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QRC Substrate Technology Characterization: buried oxide layer?

anla

Hi.

Is it, in principle, possible to define a buried oxide layer in QRC TCT?

From the manual and the tutorial, I found that oxide-filled trenches are defined by a doping profile starting at depth x, where x is the trench depth. However, I believe this procedure cannot be used for buried oxide layers. Am I wrong or do I have to use an alternative approach?

Thank you and kind regards.

André

  • Please contact customer support. We'd really need more info from you, such as what kind of process is it (maybe SOI?) and what in the substrate you need to extract, and what's part of the models. It would be quite hard to answer this in the forums because it may need discussion about technology details that the foundry NDA disallows you from sharing in public.

    Regards,

    Andrew.

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