Hi,I am following a RAK to synchronize my Virtuoso - Innovus OA DB. So the RAK says that The dbuperuu value of maskLayout section in the dumped techfile from the basePDK library should be the same to the UNITS value of the techLEF file.I have a lef file where DATABASE MICRONS 2000and an OA techfile wheremaskLayout "micron" 1000
Which one should I change?
The recommendation would to be to change the OA techfile value to 2000. Following this you would need to scale all views of viewType maksLayout in the technology library and any design libraries
There are a number of COS articles which touch on this subject.
LEF/DEF based designs in the SOCE realm typically use a dbuPerUU of 2000. DFII based custom designs typically use a dbuPerUU of 1000.
We need to scale up the custom design data to 2000 dbuPerUU so that the digital library elements and custom design data can be used together in a mixed platform design environment.We have two tasks here. One is to change the dbuPerUU in the technology file and the other is to scale the physical elements to compensate for the change in dbuPerUU.
Thank you Norman for your reply!I also have multiple ERRORS and WARNINGS like the following:......WARNING: (OALEFDEF-23083): /mnt/scratch_a/users/a/akdimitri/prj/innovus/InnovusDB/libs/lef/tcbn65gplus_7lmT1.lef(216-284) : The parameter value for minProtrusionNumCut does not match parameter value in the referenced technology database. This constraint is ignored.ERROR: (OALEFDEF-50109): /mnt/scratch_a/users/a/akdimitri/prj/innovus/InnovusDB/libs/lef/tcbn65gplus_7lmT1.lef(216-284) : LAYER M3: PropertyCAPACITANCE does not match the referenced technology database: 'tsmcN65'. Cannot modify a referenced technology database. Technology information was ignored. Ensure the technology data in this LEF file matches the referenced technology database.......Summary: 113 Errors, 18 Warnings.Do you have any suggestions about it?Thank you in advanceDimitris
Strangely it's not uncommon for the LEF and OA techfile values to be out of sync. The document referenced below gives more details on the type of messages you are seeing
LEF In/Out Error Message Troubleshooting Guide
It gives a description of the messages and advice on how to resolve the conflicts.
Hi Norman, I followed the instructions you provided to me. I changed the OA techfile and I loaded the new techfile. Because I do not have write access on PDK files, the result from the newly loaded ASCII file was loaded in virtual memory. So, now I want to run the following command: XScale -mag 2 -lib myLibraryName -viewType maskLayout The document I read says that: If your libraries are not writable, or your cds.lib is not writable or incorrect, or your mag value is not appropriate, XScale will do nothing, but in the current release will not report anything either, leaving the user to believe that everything executed as expected. Therefore my question is: Having loaded the new technology in virtual memory, is the result of the above command correct? Can I proceed with the sync of OA DB? Every time I want to edit a circuit, do I have to do the above procedure? Thank you again,Dimitris